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Application of Atmospheric Pressure Chemical Vapor Deposition (APCVD) to the production of thin film coated glass is addressed in this study. Several layers of thin solid film are deposited on the surface of the glass as it moves underneath the APCVD applicator system at high temperature. High velocity in the vicinity of the deposition zone is desirable. Two separated regions of recirculating fluid are generated as the fluid jet exits the injector. The memory effect in the form of thickness streaks, corresponding to the location of the inlet holes located upstream in the upper manifold feed channel, are evident on the thin film. Also, the velocity field in the injector channel is influenced by the location of the holes. This nonuniform gas flow across the glass causes a color variation of the coating. Effective mixing of the gas streams is required to treat the hole memory problem. However, premature reaction is to be avoided.